CAS No.: | 7783-82-6 |
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Formula: | Wf6 |
EINECS: | 232-029-1 |
Constituent: | Industrial Pure Air |
Grade Standard: | Industrial Grade |
Chemical Property: | Combustion-Supporting Gas |
Customization: |
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Tungsten hexafluoride, also known as WF6, is a chemical compound composed of one tungsten atom and six fluorine atoms. It is an inorganic, colorless, and pungent-smelling gas at room temperature. WF6 is widely used in various industrial applications, particularly in the semiconductor industry for chemical vapor deposition (CVD) processes.
Here are some key points about tungsten hexafluoride:
Properties: Tungsten hexafluoride is a highly volatile and reactive compound. It has a molecular weight of 297.84 g/mol and a boiling point of 17.1°C (62.8°F). It readily reacts with water and moisture in the air to produce hydrofluoric acid (HF) and tungstic acid (H2WO4).
Uses: The primary application of WF6 is in the semiconductor industry for depositing tungsten film layers during the manufacturing of integrated circuits (ICs). It is used as a precursor in the CVD process to create thin films of tungsten on silicon wafers. These films act as conductive layers or barrier materials in microelectronic devices. WF6 is also employed in the production of tungsten carbide, a hard and wear-resistant material used in cutting tools and wear parts.
Safety Considerations: Tungsten hexafluoride is highly toxic and corrosive. It reacts exothermically with water, releasing toxic hydrogen fluoride gas. Therefore, it requires careful handling and storage in specialized containers. Proper ventilation and personal protective equipment (PPE) should be used when working with WF6. Handling and usage should be conducted in a well-controlled industrial setting with appropriate safety measures in place.
Environmental Impact: WF6 is a greenhouse gas and can contribute to global warming if released into the atmosphere. It is important to handle and dispose of this compound responsibly, following relevant regulations and guidelines to minimize its environmental impact.
Test items | Units | Quality requirements | Test results |
CF4 | ppm | <0.5 | <0.01 |
O2 | ppm | <0.5 | <0.01 |
N2 | ppm | <1 | 0.03 |
CO | ppm | <0.5 | <0.02 |
CO2 | ppm | <0.5 | <0.01 |
SiF4 | ppm | <0.5 | <0.1 |
SF6 | ppm | <0.5 | <0.1 |
HF | ppm | <5 | 0.19 |
Al | ppb | ≤10 | <0.020 |
As | ppb | ≤10 | <0.001 |
B | ppb | ≤10 | <0.005 |
Ca | ppb | ≤5 | <0.200 |
Cd | ppb | ≤2 | <0.001 |
Cr | ppb | ≤10 | <0.020 |
Fe | ppb | ≤10 | <0.007 |
K | ppb | ≤5 | <0.100 |
Mn | ppb | ≤10 | <0.001 |
Na | ppb | ≤5 | <0.040 |
Th | ppb | ≤0.1 | <0.001 |
Ti | ppb | ≤10 | <0.002 |
Li | ppb | ≤10 | <0.002 |
U | ppb | ≤0.05 | <0.001 |
Zn | ppb | ≤10 | <0.005 |
Si | ppb | ≤10 | <0.100 |
Pb | ppb | ≤10 | <0.001 |
P | ppb | ≤2 | <0.300 |
Mg | ppb | ≤10 | <0.020 |
Ni | ppb | ≤20 | <0.030 |
Cu | ppb | ≤5 | <0.005 |
Mo | ppb | ≤10 | <0.001 |
Total impurities of other metal | ppb | ≤500 | <0.0010 |
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